Design for Manufacturability with Advanced Lithography
David Z. Pan, Bei Yu
Springer International Publishing 
Naturwissenschaften, Medizin, Informatik, Technik / Elektronik, Elektrotechnik, Nachrichtentechnik
Beschreibung
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
Kundenbewertungen
Electron beam lithography, Design for Manufacturability and Yield, Nano-CMOS Design for Manufacturability, Design for Manufacturability, Multiple patterning lithography, Triple Patterning Lithography