Atomic Layer Deposition
Marja-Leena Kääriäinen, Arthur Sherman, David Cameron, et al.
Naturwissenschaften, Medizin, Informatik, Technik / Chemie
Beschreibung
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Kundenbewertungen
Industrial Engineering / Manufacturing, Nanotechnology, Industrielle Verfahrenstechnik, Dünne Schicht, Thin Films, Surfaces & Interfaces, Spezialthemen Nanotechnologie, Dünne Schichten, Oberflächen u. Grenzflächen, Materialwissenschaften, Nanotechnology Special Topics, Produktion i. d. Industriellen Verfahrenstechnik, Atomlagenabscheidung, Industrial Engineering, Nanotechnologie, Materials Science