Atomic Layer Deposition
David Cameron, Arthur Sherman, Marja-Leena Kääriäinen, et al.
Naturwissenschaften, Medizin, Informatik, Technik / Chemie
Beschreibung
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Kundenbewertungen
Industrial Engineering / Manufacturing, Nanotechnology, Dünne Schicht, Produktion i. d. Industriellen Verfahrenstechnik, Industrielle Verfahrenstechnik, Nanotechnologie, Atomlagenabscheidung, Dünne Schichten, Oberflächen u. Grenzflächen, Nanotechnology Special Topics, Materials Science, Thin Films, Surfaces & Interfaces, Materialwissenschaften, Spezialthemen Nanotechnologie, Industrial Engineering